Life Sciences

Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the manufacture of electronic components, and are key materials for the preparation of surface electronic films such as wafers, panels, and solar cells. In a vacuum state, accelerated ions are used to bombard the solid surface. The ions and the atoms on the solid surface exchange momentum, so that the atoms on the solid surface leave the solid and deposit on the substrate surface to form the required thin film. This process is called sputtering. The bombarded solid is the source material for depositing thin films by sputtering, that is, the sputtering target.
In recent years, the advancement of semiconductor technology, the increasing use of electronic devices, and the continuous research and development of materials science are driving the growth of the sputtering target market.

Types and Characteristics of Sputtering Targets
From the perspective of chemical composition, sputtering targets are mainly divided into metal targets, alloy targets and ceramic compound targets:
Metal targets include high-purity metal materials such as copper, aluminum, titanium, and tantalum. These materials are usually used to make conductive layers or barrier layers, and have good conductivity and corrosion resistance.
Alloy targets include nickel-chromium alloys, titanium-aluminum alloys, etc., which have specific physical and chemical properties, such as improved mechanical strength and corrosion resistance.
Ceramic targets are composed of compounds such as oxides and carbides, have high strength and chemical stability, and are often used in the preparation of thin films requiring special properties.
From the shape classification, sputtering targets can be divided into planar targets and rotating targets:
Planar targets are usually round or rectangular, stationary, and parallel to the substrate during sputtering.
Rotating targets are tubular, and an electromagnetic field is formed by a magnet to rotate the target during sputtering to improve sputtering efficiency.

Selection of Targets
The choice of targets not only dictates the composition of the deposited film, but also its microstructure, adhesion, electrical and optical characteristics. Purity, density, grain size, mechanical properties, thermal and electrical conductivity, deposition rate are a few of the influencing factors in choosing a sputtering target.
Purity: Any impurities may affect the electrical, optical and mechanical properties of the film. The purer the target, the better the quality of the film.
Density: The density of the target directly affects the uniformity of the sputtering rate and the service life of the target. High-density targets usually wear more slowly under continuous ion bombardment due to their denser structure, and the targets can be used for longer periods of time without frequent replacement.
Grain size: Smaller grain size can reduce the defects that may be generated during sputtering, thereby improving the uniformity of the film.
Mechanical properties: The durability and thermal stability of the target material under high-energy ion bombardment are critical to ensure life and maintain target integrity.
Thermal and electrical conductivity: Good thermal conductivity helps dissipate the heat generated during sputtering, preventing the target from overheating and potential damage. Low resistivity is important for efficient power transfer to the target in a magnetron sputtering system.
Deposition rate: Higher deposition rates mean faster production times and higher throughput.

What Are the Uses of Sputtering Targets?
Semiconductor industry: Deposition of thin films for integrated circuits, transistors, and memory devices.  
Optical coatings: Manufacturing of anti-reflective coatings, mirrors, and filters.  
Decorative coatings: Producing decorative finishes on jewelry, watches, and other consumer goods.
Medical implants: Creating biocompatible coatings for orthopedic and dental implants.  
Solar cells: Depositing thin films for photovoltaic cells.

Created: 20 Jan 2025 07:01:07 AM